An electrodeless capacitive rf discharge operated at 13.56 MHz, which
we used previously in diamond deposition experiments, was placed in a
specially constructed furnace in order to control the temperature inde
pendently of rf power. Methane highly diluted in hydrogen as well as p
ure hydrogen were used as process gases. The emitted light from the pl
asma was investigated by optical emission spectroscopy. The relation b
etween the rotational temperatures determined from the R branch of the
G1 Sigma(g)(+) --> B-1 Sigma(u)(+) (0-0) band of molecular hydrogen w
ith furnace temperature, rf power and pressure was investigated. From
the results we have to conclude, that the assessed rotational temperat
ure can be used only as a rough value for the gas kinetic temperature.