SINTERING KINETICS OF SILICA-TITANIA SOL-GEL FILMS ON SILICON-WAFERS

The sintering behavior of 80SiO(2)-20TiO(2) sol-gel thin films on Si w afers, prepared by spin coating, was studied by the calculation of den sity asa function of temperature, from refractive index measurements a nd the Lorenz-Lorentz relationship. The sintering kinetics of the film s were fit to the Mackenzie and Shuttleworth model, over the temperatu re range of 700 degrees C-850 degrees C. Using this model, the viscosi ty was determined asa function of temperature. These gel films sintere d to full density at 850 degrees C.