Using a Plasma Assisted Sintering (PAS) process, submicron size, silic
on nitride powders were consolidated to >99% of the theoretical densit
y (TD) at 1750 degrees C in less than 5 min with retention of the a ph
ase and the submicron grain size. The silicon nitride powders were sin
tered with 5 wt. % Y2O3 and 5 wt. % Y2O3 + 5 wt. % MgAl2O4 additives.
The PAS processing method for the silicon nitride additive mixtures is
attractive for retention of fine-grained microstructures favorable fo
r superplastic deformation. Post superplastic forming heat treatments
to transform the alpha-Si3N4 to lath-like, creep-resistant beta-Si3N4
is another feature of the present processing method.