TUNNELING SPECTROSCOPY OF HALOGEN ADLAYERS ON AG(111) SURFACES

Citation
Jh. Schott et Hs. White, TUNNELING SPECTROSCOPY OF HALOGEN ADLAYERS ON AG(111) SURFACES, Journal of physical chemistry, 98(1), 1994, pp. 297-302
Citations number
38
Categorie Soggetti
Chemistry Physical
ISSN journal
00223654
Volume
98
Issue
1
Year of publication
1994
Pages
297 - 302
Database
ISI
SICI code
0022-3654(1994)98:1<297:TSOHAO>2.0.ZU;2-2
Abstract
Tunneling spectroscopy measurements performed with a scanning tunnelin g microscope (STM) of Ag(111) surfaces covered with a monolayer of hal ogen atoms (F, Cl, Br, and 1) are reported. At positive sample biases, the tunneling current rises sharply from the nanoampere range well in to the microampere range for all Ag(111)-halogen systems. The threshol d voltage of this diodelike response is a function of the halogen spec ies and correlates with vibrational energies of the respective Ag-halo gen system determined from resonant Raman scattering. The minimum tunn el junction resistance is approximately piHBAR/e2, in agreement with t heoretical predictions based on models of a point-contact single-atom junction or a double-barrier tunnel junction. The results are discusse d in terms of a point contact formed between the tip and surface halog en atom and resonant tunneling coupled to the vibrational modes of the Ag-halogen bond.