GROWTH OF CUGASE2 FILM BY MOLECULAR-BEAM EPITAXY

Citation
A. Yamada et al., GROWTH OF CUGASE2 FILM BY MOLECULAR-BEAM EPITAXY, Microelectronics, 27(1), 1996, pp. 53-58
Citations number
15
Categorie Soggetti
Engineering, Eletrical & Electronic
Journal title
ISSN journal
00262692
Volume
27
Issue
1
Year of publication
1996
Pages
53 - 58
Database
ISI
SICI code
0026-2692(1996)27:1<53:GOCFBM>2.0.ZU;2-1
Abstract
Cu-Ga-Se films of different composition prepared by MBE technique were examined by reflection high energy electron diffraction, electron pro be for micro analysis, X-ray diffraction and photoluminescence. The va lence stoichiometry of the films is fulfilled at unity molecularity, s howing that CuGaSe2 is possible to be grown by MBE. The valence stoich iometry is almost conserved in a wide range of molecularity of the fil ms. It is proven that the films have chalcopyrite structure over a rem arkably wide range of Cu-rich composition and that the CuGaSe2 films a re epitaxially grown with the c-axis perpendicular to the (001) plane of GaAs substrate. The low temperature photoluminescence on epitaxiall y grown films of nearly stoichiometric and Cu-rich composition show sh arp emission peaks at 1.71 eV attributed to exciton recombination, ind icating that the him quality is rather high.