ACCURATE CALIBRATION OF TXRF USING MICRODROPLET SAMPLES

Authors
FABRY L PAHLKE S KOTZ L
Citation
L. Fabry et al., ACCURATE CALIBRATION OF TXRF USING MICRODROPLET SAMPLES, Fresenius' journal of analytical chemistry, 354(3), 1996, pp. 266-270
Citations number
30
Categorie Soggetti
Chemistry Analytical
Journal title
Fresenius' journal of analytical chemistry → ACNP
ISSN journal
09370633
Volume
354
Issue
3
Year of publication
1996
Pages
266 - 270
Database
ISI
SICI code
0937-0633(1996)354:3<266:ACOTUM>2.0.ZU;2-X
Abstract
TXRF has been applied in combination with VPD to the analysis of trace impurities in the native oxide layer of Si wafer surfaces down to the range of 10(x) atoms cm(-2). Proper quantification of VPD/TXRF data r equires calibration with microdroplet standard reference wafers. The p recision of calibration function has been evaluated and found to allow quantification at a high level of 3 sigma confidence with microdrople t standard reference.