In this paper, the realization and quality evaluation of low-temperatu
re silicon direct bonding (LTSDB) have been described. Through high-re
solution electron microscope (HREM) and secondary ion mass spectroscop
y (SIMS) methods, the bonding interface characteristics have been inve
stigated. The interface structure, such as dislocations and random dis
tribution of SiO2, are observed in HREM images. The SIMS results show
the distribution near the bonding interface and other properties of Si
-H atomic groups. We propose a new two-step LTSDB mechanism.