FORMATION OF THE CE Y2O3 INTERFACE - AN IN-SITU XPS STUDY/

Citation
N. Thromat et al., FORMATION OF THE CE Y2O3 INTERFACE - AN IN-SITU XPS STUDY/, Surface science, 345(3), 1996, pp. 290-302
Citations number
22
Categorie Soggetti
Chemistry Physical
Journal title
ISSN journal
00396028
Volume
345
Issue
3
Year of publication
1996
Pages
290 - 302
Database
ISI
SICI code
0039-6028(1996)345:3<290:FOTCYI>2.0.ZU;2-D
Abstract
We have studied the formation of the Ce/Y2O3 interface by X-ray photoe lectron spectroscopy (XPS) from a Ce vapor deposited onto a polycrysta lline stoichiometric Y2O3 sample. The substrate temperature ranged bet ween the room temperature and 850 degrees C, which is above the cerium melting point (795 degrees C). The shape of the Ce 3d photoelectron l ines shows that even at room temperature, an interfacial compound Ce2O 3-x forms over a few atomic layers. When the substrate temperature inc reases, the thickness of this oxidized layer increases. A model based on a diffusion mechanism of oxygen atoms coming from the oxide substra te is proposed to account for the experimental results.