Gd. Sharma et al., STUDY ON ELECTRICAL AND PHOTOELECTRICAL BEHAVIOR OF UNDOPED AND DOPEDFURAZANO[3,4-B]PIPERAZINE (FP) THIN-FILM DEVICES, Synthetic metals, 75(3), 1995, pp. 201-207
Furazano[3,4-b] piperazine (FP), a system where the furazan ring is fu
sed to the saturated heterocyclic ring, was synthesized by oximation o
f glyoxal, followed by chlorination and then condensation with ethylen
e diamines to give 2,3-piperazine dione dioxime, which on further cycl
odehydration results in the desired furazano piperazine. The material
was doped with FeCl3 and CuCl2 in acidic medium. Optical properties we
re studied in the UV-Vis-IR region. Electrical and photoelectrical pro
perties of Al/FP/ITO, Ag/FP/ITO, Al/Fe-doped FP/ITO and Al/Cu-doped FP
/ITO devices were observed. I-V and C-V measurements reveal the format
ion of the Schottky barrier at Al/FP interfaces. This indicates that F
P behaves as a p-type organic semiconductor. J-V characteristics of th
e Al/FP/ITO device show ohmic conduction in the low voltage region and
space charge limited conduction at the high voltage region. Various e
lectrical and photovoltaic parameters were calculated from the analysi
s of I-V and C-V data and are discussed in detail.