MICROSTRUCTURE, FRICTION, AND WEAR CHARACTERISTICS OF THE AS-DEPOSITED AND CARBON ION-IMPLANTED DIAMOND FILMS

Authors
WU RLC RAI AK MIYOSHI K
Citation
Rlc. Wu et al., MICROSTRUCTURE, FRICTION, AND WEAR CHARACTERISTICS OF THE AS-DEPOSITED AND CARBON ION-IMPLANTED DIAMOND FILMS, Applied physics letters, 68(8), 1996, pp. 1054-1056
Citations number
12
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
68
Issue
8
Year of publication
1996
Pages
1054 - 1056
Database
ISI
SICI code
0003-6951(1996)68:8<1054:MFAWCO>2.0.ZU;2-B
Abstract
The microstructure, friction and wear characteristics of the as-deposi ted and carbon ion (160 keV, 6.7x10(17) ions/cm(2)) implanted polycrys talline diamond films grown by plasma-enhanced chemical vapor depositi on were studied. Cross sectional transmission electron microscopy reve aled the amorphous nature of the ion bombarded film. Raman peaks of th e ion-implanted film are found to be consistent with the noncrystallin e carbon. The pin-on-disk technique was used to determine the friction and wear characteristics of the diamond films in an ultrahigh vacuum (10(-7) Pa) at room temperature. Compared to the as-deposited film, co nsiderable reduction in friction and wear of the ion-implanted film wa s observed. (C) 1996 American Institute of Physics.