Thin films with mostly (Hg,T1)(1)Ba2Ca3Cu2O8+delta[(Hg,T1)-1223] phase
have been fabricated by radio frequency magnetron sputtering of precu
rsor films and post-annealing method. The doping of a small amount of
thallium in the film is helpful to the formation of the three-layer Cu
O2 compound. These films have a highly oriented structure with the c-a
xis perpendicular to the film surface. Resistivity measurements show t
hat the films after annealing at 300 degrees C for 1 h in O-2 have the
superconducting transition temperature of T-c(onset)=133 K and T-c(ze
ro)=127 K. Scanning electron micrographs of the film reveal platelike
micrometer-size grains coalesce to cover the substrate surface. (C) 19
96 American Institute of Physics.