COMPARISON OF THEORETICAL AND EXPERIMENTAL ELECTRONIC DISTRIBUTIONS OF SI-NI AND SI-ER ALLOYS

Citation
A. Gheorghiu et al., COMPARISON OF THEORETICAL AND EXPERIMENTAL ELECTRONIC DISTRIBUTIONS OF SI-NI AND SI-ER ALLOYS, Journal of physics. Condensed matter, 8(6), 1996, pp. 719-728
Citations number
16
Categorie Soggetti
Physics, Condensed Matter
ISSN journal
09538984
Volume
8
Issue
6
Year of publication
1996
Pages
719 - 728
Database
ISI
SICI code
0953-8984(1996)8:6<719:COTAEE>2.0.ZU;2-4
Abstract
The total and partial densities of states of SiNi3, Si2Ni and Si1.7Y h ave been calculated using a scalar relativistic self-consistent augmen ted plane-wave method (SiNi3) or a self-consistent linear muffin-tin o rbital method in the atomic sphere approximation (Si2Ni and Si1.7Y) Th e x-ray photoemission valence band and soft-x-ray emission Si K beta a nd Ni L alpha spectra have been calculated by applying appropriate bro adening factors to the theoretical densities-of-states curves; in the case of the x-ray photoemission spectra, photoionization cross section s have been taken into account. Very good agreement is found between t he experimental x-ray photoemission and soft-x-ray emission spectra an d the simulated spectral curves.