INFLUENCE OF OXYGEN ON SURFACE-MORPHOLOGY OF METALORGANIC VAPOR-PHASEEPITAXY-GROWN GAAS(001)

Citation
S. Nayak et al., INFLUENCE OF OXYGEN ON SURFACE-MORPHOLOGY OF METALORGANIC VAPOR-PHASEEPITAXY-GROWN GAAS(001), Applied physics letters, 68(9), 1996, pp. 1270-1272
Citations number
15
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
68
Issue
9
Year of publication
1996
Pages
1270 - 1272
Database
ISI
SICI code
0003-6951(1996)68:9<1270:IOOOSO>2.0.ZU;2-C
Abstract
Atomic force microscopy has been used to investigate the influence of controlled oxygen incorporation on the surface morphology of GaAs film s grown by metalorganic vapor phase epitaxy (MOVPE). Oxygen influences the periodic morphology observed in GaAs surfaces, with concentration s about 10(18) cm(-3) leading to a breakup of the periodicity. To acco unt for these observations, we propose a model in which oxygen prefere ntially attaches at steps with a subsequent reduction in step mobility and a concomitant increase in the surface roughness. (C) 1996 America n Institute of Physics.