S. Nayak et al., INFLUENCE OF OXYGEN ON SURFACE-MORPHOLOGY OF METALORGANIC VAPOR-PHASEEPITAXY-GROWN GAAS(001), Applied physics letters, 68(9), 1996, pp. 1270-1272
Atomic force microscopy has been used to investigate the influence of
controlled oxygen incorporation on the surface morphology of GaAs film
s grown by metalorganic vapor phase epitaxy (MOVPE). Oxygen influences
the periodic morphology observed in GaAs surfaces, with concentration
s about 10(18) cm(-3) leading to a breakup of the periodicity. To acco
unt for these observations, we propose a model in which oxygen prefere
ntially attaches at steps with a subsequent reduction in step mobility
and a concomitant increase in the surface roughness. (C) 1996 America
n Institute of Physics.