E. Freeman et D. Snowdenifft, A NEW TECHNIQUE TO MEASURE THE ETCH RATE OF MICA, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 108(1-2), 1996, pp. 129-132
We have developed a new technique for measuring the general etch rate
of mica in hydrofluoric acid. A laser interferometer is used to monito
r the thickness of the sample as it etches. This technique can be exte
nded to other materials and etchants.