A NEW TECHNIQUE TO MEASURE THE ETCH RATE OF MICA

Citation
E. Freeman et D. Snowdenifft, A NEW TECHNIQUE TO MEASURE THE ETCH RATE OF MICA, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 108(1-2), 1996, pp. 129-132
Citations number
6
Categorie Soggetti
Physics, Nuclear","Nuclear Sciences & Tecnology","Instument & Instrumentation
ISSN journal
0168583X
Volume
108
Issue
1-2
Year of publication
1996
Pages
129 - 132
Database
ISI
SICI code
0168-583X(1996)108:1-2<129:ANTTMT>2.0.ZU;2-G
Abstract
We have developed a new technique for measuring the general etch rate of mica in hydrofluoric acid. A laser interferometer is used to monito r the thickness of the sample as it etches. This technique can be exte nded to other materials and etchants.