IMPROVEMENT IN THE PHOTOLUMINESCENCE EFFICIENCY OF POROUS SILICON USING HIGH-ENERGY SILICON ION IRRADIATION

Citation
Tm. Bhave et al., IMPROVEMENT IN THE PHOTOLUMINESCENCE EFFICIENCY OF POROUS SILICON USING HIGH-ENERGY SILICON ION IRRADIATION, Journal of physics. D, Applied physics, 29(2), 1996, pp. 462-465
Citations number
11
Categorie Soggetti
Physics, Applied
ISSN journal
00223727
Volume
29
Issue
2
Year of publication
1996
Pages
462 - 465
Database
ISI
SICI code
0022-3727(1996)29:2<462:IITPEO>2.0.ZU;2-3
Abstract
An order of magnitude enhancement in the intensity of visible room tem perature photoluminescence (PL) from porous silicon (PS) was observed when irradiated with 10 MeV (7(+)) silicon ions from a pelletron sourc e. The effect was associated with a blue shift of 70 nm. The stability of PL with respect to ambients was seen to be remarkably improved. Th e energy band gap determined from photoluminescence and photoreflectan ce measurements indicated a shift from 1.67 eV to 1.83 eV. Subsequentl y partial restructuring of Si-O-Si and Si-H type species into Si-OH wa s confirmed by infrared measurements recorded before and after irradia tion. The effects have been correlated to a reduction in the extent of non radiative recombination centres as a consequence of chemical rest ructuring of the surface. By assuming that the restructured surface is sufficiently thick to reduce the crystallite size, the blue shift can be accounted for. Formation of Si-OH bonds at the surface was also ob served when PS was intentionally exposed to low-energy (10-30 eV) OH- ions from an electron cyclotron resonance (ECR) plasma; associated wit h this, the PL intensity was enhanced.