Tm. Bhave et al., IMPROVEMENT IN THE PHOTOLUMINESCENCE EFFICIENCY OF POROUS SILICON USING HIGH-ENERGY SILICON ION IRRADIATION, Journal of physics. D, Applied physics, 29(2), 1996, pp. 462-465
An order of magnitude enhancement in the intensity of visible room tem
perature photoluminescence (PL) from porous silicon (PS) was observed
when irradiated with 10 MeV (7(+)) silicon ions from a pelletron sourc
e. The effect was associated with a blue shift of 70 nm. The stability
of PL with respect to ambients was seen to be remarkably improved. Th
e energy band gap determined from photoluminescence and photoreflectan
ce measurements indicated a shift from 1.67 eV to 1.83 eV. Subsequentl
y partial restructuring of Si-O-Si and Si-H type species into Si-OH wa
s confirmed by infrared measurements recorded before and after irradia
tion. The effects have been correlated to a reduction in the extent of
non radiative recombination centres as a consequence of chemical rest
ructuring of the surface. By assuming that the restructured surface is
sufficiently thick to reduce the crystallite size, the blue shift can
be accounted for. Formation of Si-OH bonds at the surface was also ob
served when PS was intentionally exposed to low-energy (10-30 eV) OH-
ions from an electron cyclotron resonance (ECR) plasma; associated wit
h this, the PL intensity was enhanced.