Gf. Cerofolini et al., ANOMALOUS OXYGEN DIFFUSIVITY AND THE EARLY STAGES OF SILICON OXIDATION, Materials science & engineering. B, Solid-state materials for advanced technology, 36(1-3), 1996, pp. 104-107
The anomalously high rates observed in the early stages of silicon oxi
dation in dry O-2 at relatively low temperature (T = 600-800 degrees C
) are explained by assuming that these kinetics are controlled by the
formation of a diffuse interface from the abrupt native interface. If
this process is limited by O-2 diffusion in silicon, the available dat
a allow the diffusivity to be determined. In particular, the activatio
n energy for O-2 diffusion is estimated to be 1.7-1.8 eV.