GENERAL-PURPOSE PLASMA BEAM FACILITY FOR DEPOSITING AND PROCESSING THIN-FILMS

Authors
BELYANIN AF SEMENOV AP SPITSYN BV
Citation
Af. Belyanin et al., GENERAL-PURPOSE PLASMA BEAM FACILITY FOR DEPOSITING AND PROCESSING THIN-FILMS, Instruments and experimental techniques, 38(4), 1995, pp. 548-552
Citations number
15
Categorie Soggetti
Instument & Instrumentation",Engineering
Journal title
Instruments and experimental techniques → ACNP
ISSN journal
00204412
Volume
38
Issue
4
Year of publication
1995
Part
2
Pages
548 - 552
Database
ISI
SICI code
0020-4412(1995)38:4<548:GPBFFD>2.0.ZU;2-2
Abstract
The paper describes a general-purpose facility for manufacturing thin films with a planar magnetron and a gas-discharge ion source operating concurrently. The features of the facility, its modes of operation, a nd the technique for growing films with various compositions are discu ssed. Thin piezoelectric AlN films and the definition of diamond film structures with an ion beam are described.