NEAR-FIELD DIRECT-WRITE ULTRAVIOLET LITHOGRAPHY AND SHEAR FORCE MICROSCOPIC STUDIES OF THE LITHOGRAPHIC PROCESS

Authors
SMOLYANINOV II MAZZONI DL DAVIS CC
Citation
Ii. Smolyaninov et al., NEAR-FIELD DIRECT-WRITE ULTRAVIOLET LITHOGRAPHY AND SHEAR FORCE MICROSCOPIC STUDIES OF THE LITHOGRAPHIC PROCESS, Applied physics letters, 67(26), 1995, pp. 3859-3861
Citations number
7
Categorie Soggetti
Physics, Applied
Journal title
Applied physics letters → ACNP
ISSN journal
00036951
Volume
67
Issue
26
Year of publication
1995
Pages
3859 - 3861
Database
ISI
SICI code
0003-6951(1995)67:26<3859:NDULAS>2.0.ZU;2-V
Abstract
Direct-write lithography on a 100 nm scale has been carried out using the near-field optical interaction between an uncoated tapered fiber t ip and a layer of photoresist. This allows both lithography and shear force microscopic examination of the surface, which reveals morphologi cal changes in the photoresist before development. (C) 1995 American I nstitute of Physics.