HIGH-SPEED P-TYPE SIGE MODULATION-DOPED FIELD-EFFECT TRANSISTORS

Citation
M. Arafa et al., HIGH-SPEED P-TYPE SIGE MODULATION-DOPED FIELD-EFFECT TRANSISTORS, IEEE electron device letters, 17(3), 1996, pp. 124-126
Citations number
18
Categorie Soggetti
Engineering, Eletrical & Electronic
ISSN journal
07413106
Volume
17
Issue
3
Year of publication
1996
Pages
124 - 126
Database
ISI
SICI code
0741-3106(1996)17:3<124:HPSMFT>2.0.ZU;2-O
Abstract
We report on the fabrication and characterization of high-speed p-type modulation-doped field-effect transistors (MODFET's) with 0.7-mu m an d 1-mu m gate-lengths having unity current-gain cut-off frequencies (f (T)) of 9.5 GHz and 5.3 GHz, respectively, The devices were fabricated on a high hole mobility SiGe heterostructure grown by ultra-high-vacu um chemical vapor deposition (UHV-CVD). The de maximum extrinsic trans conductance (g(m)) is 105 mS/mm (205 mS/mm) at room temperature (77 K) for the 0.7-mu m gate length devices, The fabricated devices show goo d pinch-off characteristics and have a very low gate leakage current o f a few mu A/mm at room temperature and a few nA/mm at 77 K.