CRITICAL-FIELD PATTERNS IN OPTICAL FIBONACCI MULTILAYERS

Citation
L. Chow et Kh. Guenther, CRITICAL-FIELD PATTERNS IN OPTICAL FIBONACCI MULTILAYERS, Journal of the Optical Society of America. A: Optics and image science, 10(10), 1993, pp. 2231-2235
Citations number
24
Categorie Soggetti
Optics
Journal title
Journal of the Optical Society of America. A: Optics and image science
ISSN journal
07403232 → ACNP
Volume
10
Issue
10
Year of publication
1993
Pages
2231 - 2235
Database
ISI
SICI code
1084-7529(1993)10:10<2231:CPIOFM>2.0.ZU;2-N
Abstract
Optical coatings with 13, 34, 55, and 89 quarter-wave layers of high- and low-index dielectric materials arranged in Fibonacci sequences F6, F8, F9, and F10, respectively, were deposited with use of a reactive low-voltage ion plating process. The calculated average transmission ( T(ave)) for phi = (1/2 +/- 1/4)pi follows a power law T(ave) almost-eq ual-to N(m)-delta, where N(m) is the number of optical quarter-wave la yers in a Fibonacci sequence F(m). The critical exponent delta for the se multilayers is compared with a renormalization calculation of the e xponent governing the total energy width for an electronic system of F ibonacci layers. Spectral-transmittance measurements of the experiment al Fibonacci multilayers show some deviation from the calculated spect ral transmittance, which is due primarily to absorption in the short-w avelength range, but these measurements do still indicate that the obs erved optical field patterns are critical.