A mathematical model is presented that describes the modified chemical
vapour deposition (CVD) process (which takes place in advance of the
electrochemical vapour deposition (EVD) process) to deposit ZrO2 insid
e porous media for the preparation and modification of ceramic membran
es. The isobaric model takes into account intrapore Knudsen diffusion
of ZrCl4 and H2O, which enter the membrane from opposite sides, and La
ngmuir-Hinshelwood reaction of the solid product ZrO2 on the internal
pore wall. The processes occurring in one single pore are investigated
, and the change in pore geometry during deposition is taken into acco
unt. Based upon this model, the deposition profile is studied. The mod
el fits reasonably well with experimental results.