INFLUENCE OF CHLORIDE-ION ON ELECTROCRYSTALLIZATION OF COPPER

A study was made to determine the effect of chloride ion during electr odeposition of copper, using an open-channel cell, Electrolysis parame ters, such as current density, copper concentration, temperature, and circulation rate were varied in the presence of chloride ion to determ ine their effect, The deposits were examined by scanning electron micr oscopy (SEM) and X-ray diffractometry (XRD) to determine morphology an d crystallographic orientations, It was observed that chloride ion aff ects the quality of the deposit surface, crystallographic orientations and deposit morphology of cathode copper, These are further affected by changing the electrolysis parameters.