ION-BEAM SENSITIZED SIO2 SURFACE FOR HALIDE-IONS

Citation
Mt. Pham et al., ION-BEAM SENSITIZED SIO2 SURFACE FOR HALIDE-IONS, Analytica chimica acta, 320(2-3), 1996, pp. 289-291
Citations number
9
Categorie Soggetti
Chemistry Analytical
Journal title
ISSN journal
00032670
Volume
320
Issue
2-3
Year of publication
1996
Pages
289 - 291
Database
ISI
SICI code
0003-2670(1996)320:2-3<289:ISSSFH>2.0.ZU;2-#
Abstract
Halide ion sensitivity was obtained on a 100 nm thin SiO2 film implant ed with Ag and Cl. An X-ray diffraction study showed the formation of metallic silver spheres with an average size of 20 nm embedded within the SiO2 matrix which are probably sheathed by a thin AgCl skin.