Thin films of hydroxyapatite (KA) were created on Ti6AI4V and fused si
lica substrates by KrF laser ablation for various mixtures of Ar/water
vapor atmosphere. The influence of deposition conditions on film prop
erties was studied. Substrate temperature was varied from 200 to 780 d
egrees C, the target-substrate distance ranged in the region of 3-8 cm
, and the energy density was 3 and 9 J cm(-2). Film properties were ch
aracterized by XRD, RES, PIXE, SEM, and by scratch test. The HA crysta
lline and adhesive layers were created. Results of experiments and the
requirements on layer properties are discussed.