BISMUTH COLLOIDS AND FILMS FROM NONAQUEOUS SOLVENTS

Bismuth colloids and metal-metal oxide films have been prepared by the method Chemical Liquid Deposition (CLD). The metal is evaporated to y ield atoms which are solvated at liquid nitrogen temperature, and upon warming stable liquid colloids, are formed with particle size ranging between 50-350 Angstrom. Zeta potentials were calculated according to the convention of Hunter and the Huckel equation, for most of these n egatively charged particles. Upon solvent removal, colloidal particles coalesce to form films, which contain some residual solvent. The synt hesis of colloids and films from Bi with acetone, 2-butanone, 4-methyl -2-pentanone, ethanol, 2-propanol, DMF, THF, DMSO, benzene and toluene is reported. Transmission Electron Microscopy (TEM) allows us to dete rmine particle size. FTIR, Thermogravimetric Analyses (TGA) and Scanni ng Electron Microscopy (SEM) have aided in film characterization. Thes e studies indicate that solvents are incorporated into the films. Resi stivity studies showed that they behave as semiconductors rather than pure metals. TGA studies reveal that loss of weight occurs within 244- 453 degrees C. The films are very stable with 5-30% weight loss at 550 degrees C.