TILT-TARGET MAGNETRON SPUTTER FOR DEPOSITION OF MAGNETOOPTICAL DISK

Citation
S. Chao et al., TILT-TARGET MAGNETRON SPUTTER FOR DEPOSITION OF MAGNETOOPTICAL DISK, JPN J A P 1, 31(2B), 1992, pp. 426-430
Citations number
2
Categorie Soggetti
Physics, Applied
Volume
31
Issue
2B
Year of publication
1992
Pages
426 - 430
Database
ISI
SICI code
Abstract
A 3.5-inch magnetooptical disk is made by tilting the TbFeCo target in a DC circular magnetron sputtering process. The composition of the re cording layer is controlled by using the Tb-rich deposition area. The optimal tilt angle of our target for uniform radial composition distri bution on the disk is found to be about 15-degrees. A model was propos ed to explain the observed Tb, Fe and Co content variation with the ti lt angle of the target. The dynamic read/write test also showed that g ood carrier to noise ratio (CNR) was obtained at this angle. A new dep osition process for magnetooptical (M-O) disk based on the tilt target method is proposed; it has the merits of enabling simultaneous deposi tion of multiple disks. The CNR of the disk made at 15-degrees tilt an gle is 53 dB.