SPUTTER-DEPOSITED C-ORIENTED LINBO3 THIN-FILMS ON SIO2

Authors
TAN S GILBERT T HUNG CY SCHLESINGER TE MIGLIUOLO M
Citation
S. Tan et al., SPUTTER-DEPOSITED C-ORIENTED LINBO3 THIN-FILMS ON SIO2, Journal of applied physics, 79(7), 1996, pp. 3548-3553
Citations number
11
Categorie Soggetti
Physics, Applied
Journal title
Journal of applied physics → ACNP
ISSN journal
00218979
Volume
79
Issue
7
Year of publication
1996
Pages
3548 - 3553
Database
ISI
SICI code
0021-8979(1996)79:7<3548:SCLTOS>2.0.ZU;2-H
Abstract
We present the development of a magnetron sputtering process for the f abrication of exclusively c-axis oriented LiNbO3 thin films on silicon substrates. The heterostructure consists of LiNbO3/Si3N4/SiO2/Si. The deposition of the Si3N4 film is key to obtaining exclusively c-orient ed LiNbO3 thin films. The deposition conditions for the LiNbO3 are dis cussed. (C) 1996 American Institute of Physics.