Zl. Peng et al., STUDY OF PHOTOCONDUCTIVITY IN ALXGA1-XAS GAAS MODULATION-DOPED HETEROSTRUCTURES/, Journal of applied physics, 79(7), 1996, pp. 3592-3596
Temperature-dependent Hall effect measurements under different illumin
ation conditions are performed on AlxGa1-xAs/GaAs heterostructures dop
ed with both Si and Sn. For a Sn-doped AlxGa1-xAs/GaAs heterostructure
with x=0.35, two distinct DX center levels are observed directly with
out exposure to light. The two-dimensional electron gas concentration
measured under illumination decreases from the value due to persistent
photoconductivity to a value less than that measured in the dark when
the excitation photon energy is larger than the band gap of the AlGaA
s barrier. This decrease occurs only at temperatures below 90 K. This
negative photoconductivity is explained by taking into account the par
tial freeze-out of electrons into the shallow DX centers and the trans
fer of holes photogenerated in the barrier into the channel region. No
such phenomena are observed in Sn-doped heterostructures with x<0.35
or in the Si-doped heterostructures. The reasons for this are also inv
estigated. (C) 1996 American Institute of Physics.