CONSIDERATIONS ON THE TEXTURE OF THE COPPER ELECTROLESS FILMS

The authors present the results of an investigation which aims to corr elate the hath deposition composition as electroless copper deposition parameter with its characteristic properties, such as crystallographi c texture and roughness. The top surface layer of copper films deposit ed on copper substrates iso (110) textured when surfactant free bath i s used, hut (100) orientation prevails for the deposit obtained when a bath containing surfactant is used. The obtained results suggest that in the presence of the surfactant the (100) face is blocked.