Td. Hallam et al., X-RAY-SCATTERING AND TOPOGRAPHY STUDIES OF HG1-XMNXTE EPITAXIAL-FILMS, Journal of physics. D, Applied physics, 26(4A), 1993, pp. 161-166
Epitaxial films of Hg1-xMnxTe (MMT), between 2 and 10 mum thick, have
been grown by MOVPE on GaAs and CdZnTe substrates and their perfection
assessed by high-resolution x-ray scattering and topography. The full
width al half height maximum (FWHM) Was found to vary inversely with
the MMT layer thickness, independently of Mn concentration or substrat
e type. A general increase in integrated intensity with thickness was
observed, though with substantial variations between individual data p
oints. Double-axis topography and triple-axis scattering showed that t
he greatest contribution to the double-axis FWHM came from tilts betwe
en subgrains within which the strain was small. Little difference was
seen either in the double-axis FWHM or triple-axis isointensity contou
rs between thick MMT layers grown on GaAs or CdZnTe substrates. The mo
del of Ayers et al does not appear to be applicable to the system, whi
ch incorporates a CdTe buffer layer on the GaAs.