GENERATION OF SHORT-PULSE VUV AND XUV RADIATION

Citation
B. Wellegehausen et al., GENERATION OF SHORT-PULSE VUV AND XUV RADIATION, Optical and quantum electronics, 28(3), 1996, pp. 267-281
Citations number
34
Categorie Soggetti
Optics,"Engineering, Eletrical & Electronic
ISSN journal
03068919
Volume
28
Issue
3
Year of publication
1996
Pages
267 - 281
Database
ISI
SICI code
0306-8919(1996)28:3<267:GOSVAX>2.0.ZU;2-K
Abstract
Starting from intense short-pulse KrF (248 nm, 25 mJ, 400 fs), Arf (19 3 nm, 10 mJ, similar to 1 ps), and Ti:sapphire (810 nm, 100 mJ, 150 fs ) laser systems, schemes for the generation of fixed-frequency and tun able VUV and XUV radiation by nonlinear optical techniques are investi gated. With the KrF system, a four-wave mixing process in xenon yields tunable radiation in the range of 130-200 nm with output energies of, so far, 100 mu J in less than 1 ps. For the XUV spectral range below 100 nm, nonperturbative high-order harmonic generation and frequency m ixing processes in noble gas jets are considered. To achieve tunabilit y, the intense fixed-frequency pump laser radiation is mixed with less intense but broadly tunable radiation from short-pulse dye lasers or optical parametric generator-amplifier systems. In this way, tunabilit y down to wavelengths of less than 40 nm has been demonstrated.