The possibilities of using x-ray capillary optics in lithography and m
icroscopy are discussed. It has been shown experimentally that these s
ystems, originally proposed by M. A. Kumakhov, may considerably simpli
fy experimental designs. A micropinch x-ray source specially designed
for these purposes has been successfully tested. The complete system c
onstructed for laboratory use may serve as a prototype for an industri
al lithography machine or microscope.