THE USE OF X-RAY CAPILLARY OPTICS FOR LITHOGRAPHY AND MICROSCOPY

Authors
ARKADIEV VA GORNY HE GRUEV DI KARNAUKHOV AA KOLOMIITSEV AI KUMAKHOV MA LANGHOFF N SHANDINTSEV DV WEDELL R
Citation
Va. Arkadiev et al., THE USE OF X-RAY CAPILLARY OPTICS FOR LITHOGRAPHY AND MICROSCOPY, Optical and quantum electronics, 28(3), 1996, pp. 309-314
Citations number
13
Categorie Soggetti
Optics,"Engineering, Eletrical & Electronic
Journal title
Optical and quantum electronics → ACNP
ISSN journal
03068919
Volume
28
Issue
3
Year of publication
1996
Pages
309 - 314
Database
ISI
SICI code
0306-8919(1996)28:3<309:TUOXCO>2.0.ZU;2-R
Abstract
The possibilities of using x-ray capillary optics in lithography and m icroscopy are discussed. It has been shown experimentally that these s ystems, originally proposed by M. A. Kumakhov, may considerably simpli fy experimental designs. A micropinch x-ray source specially designed for these purposes has been successfully tested. The complete system c onstructed for laboratory use may serve as a prototype for an industri al lithography machine or microscope.