CHEMICAL-VAPOR-DEPOSITION OF SILICON-NITRIDE FILAMENTS FROM SILICON SUBHYDRIDES AND AMMONIA

This paper describes the synthesis of monocrystalline alpha-silicon ni tride filaments. The synthesis is based on a catalysed chemical vapour deposition process using ii on or iron alloys as catalysts and silico n subhydrides and ammonia as gaseous precursors of silicon nitride. Fo r in situ production of silicon subhydrides by gasification of silicon powder with hydrogen superficially nitrided silicon powder was used t o guarantee constant production rates up to 10 h and more. The kinetic s of filament growth ape shown to be determined by the solubility of n itrogen in and the diffusion of nitrogen through the catalyst particle .