K. Suzuki et al., HIGH-RESOLUTION ELECTRON-MICROSCOPY OF DISSOCIATED DISLOCATIONS IN SILICON WITH A NORMAL-INCIDENT ELECTRON-BEAM, Philosophical magazine. A. Physics of condensed matter. Structure, defects and mechanical properties, 73(2), 1996, pp. 431-441
Lattice image simulations appropriate to high resolution electron micr
oscopy (HREM) imaging conditions have been produced for partial disloc
ations in Si under the condition that the electron beam is parallel to
the normal to the stacking fault plane. It is shown that the position
s of partial dislocations can be determined by the difference in the l
attice image between the faulted and unfaulted regions; hence the exis
tence of kinks can be resolved under appropriate conditions. Image sim
ulations have also been made for reconstructed 90 degrees- and 30 degr
ees-partial dislocations. The results show that the reconstruction may
be detected by HREM for the 30 degrees partial but not for the 90 deg
rees partial. HREM experiments on dislocations in Si introduced by pla
stic deformation reveal that: (i) the positions of partial dislocation
s can be determined for thin samples, (ii) 30 degrees and 90 degrees p
artials are easily distinguishable, (iii) high density kinks are obser
ved, but it is concluded that these are produced, during observation,
by electron beam irradiation, and (iv) no evidence has been obtained f
or the reconstruction of 30 degrees-partial dislocation.