N. Hirosaki et al., EFFECT OF GRAIN-GROWTH ON THE THERMAL-CON DUCTIVITY OF SILICON-NITRIDE, Nippon Seramikkusu Kyokai gakujutsu ronbunshi, 104(1), 1996, pp. 49-53
Thermal conductivity of sintered silicon nitride has been improved by
grain growth of beta-Si3N4. beta-Si3N4 containing 0.5 mol% Y2O3 and 0.
5 mol% Nd2O3 was gas-pressure sintered at 1973 to 2473 K and the micro
structures and the thermal conductivities were investigated. The mater
ials sintered at temperatures higher than 2173 K had a microstructure
of ''in-situ composite'' with smaller beta-Si3N4 matrix grains and a s
mall amount of elongated beta-Si3N4 grains, The grain size increased w
ith increasing sintering temperature. Room temperature thermal conduct
ivity increased with increasing sintering temperature; 122 W . m(-1).
K-1 was produced by sintering at 2473 K-this value was about two times
higher than the values reported up to this time, Higher thermal condu
ctivities were established by growth of Si3N4 grains and decrease in t
he amount of two-grain junctions.