RF AEROSOL PLASMA FABRICATION OF INDIUM TIN OXIDE AND TIN OXIDE THIN-FILMS

Transparent, conductive indium-tin oxide (ITO) and tin oxide thin film s were deposited on soda-lime-silicate (SLS) float glass and silica gl ass substrates by an RF aerosol plasma technique in an atmospheric env ironment. The ITO films were deposited from solutions with various In: Sn ratios. The dependence of the film properties on the substrate temp erature, deposition time, and tin concentration has been studied. The films were characterized by several techniques including XRD, EDS, ele ctrical resistivity, SEM, optical (IR-UV-Vis transmission), Mossbauer, and infrared spectroscopy. The results showed that film phase, morpho logy, thickness, crystallite size, and conductivity depend on the solu tion composition and deposition parameters. XRD revealed that In2O3 wa s present in the film when a In:Sn ratio of 5:5 or higher was used; ot herwise only SnO2 shown. SEM analysis showed that dense and uniform fi lms were formed with particle sizes ranging from approximately 50 nm t o 150 nm. The resistivity of the ITO films ranged from 0.12 to 5.0 ohm -cm at room temperature. Optical transmission of the ITO-coated glasse s was not different from the uncoated samples. Infrared results indica ted that the structure of the near surface of the glasses was signific antly modified with a higher indium concentration. The advantages of t he atmospheric, RF aerosol plasma deposition process over other techni ques are discussed.