PATTERNING OF EPITAXIAL ORGANIC FILMS BY SELECTIVE EPITAXIAL-GROWTH

A new method of patterning crystalline organic molecular films is prop osed and demonstrated. It utilizes a selective growth, or the differen ce in the sticking coefficient of an organic material on various inorg anic substrates in a certain temperature range. The object structure i s first patterned on a single-crystalline substrate with an epitaxial film of a different material grown by molecular beam epitaxy (MBE) thr ough a mask, and then a beam of the organic molecule is irradiated uni formly after removing the mask.