CONTROLLED SHIFT OF THE OPTICAL RESONANCE OF FULLY PROCESSED ASYMMETRIC FABRY-PEROT MODULATOR ARRAYS

We present two ways to shift the Fabry-Perot resonance of processed as ymmetric Fabry-Perot modulator arrays: being wet chemical etching and off-axis incident light. These methods can be used to tune the resonan ce wavelength, contrast, on-state reflectivity or voltage to an optima l value for specific applications after growth and definition of the a rrays. In particular, the etch process is optimized to obtain a reprod ucible cavity thickness and retain the reflection homogeneity across a n array. We further compare the results of the etching technique to th e shift of the spectra as a function of the angle of the incident ligh t on the arrays. This demonstrates a more efficient exciton absorption for off-axis incident light and confirms that the etch process does n ot degrade the characteristics of the modulator.