RESULTS OF MODELING LASER-INDUCED PLASMA IN PULSED-LASER DEPOSITION

Citation
G. Granse et S. Vollmar, RESULTS OF MODELING LASER-INDUCED PLASMA IN PULSED-LASER DEPOSITION, IEEE transactions on plasma science, 24(1), 1996, pp. 47-48
Citations number
9
Categorie Soggetti
Phsycs, Fluid & Plasmas
ISSN journal
00933813
Volume
24
Issue
1
Year of publication
1996
Pages
47 - 48
Database
ISI
SICI code
0093-3813(1996)24:1<47:ROMLPI>2.0.ZU;2-M
Abstract
Pulsed laser deposition (PLD) as a method for thin-film deposition is distinguished by high energy and density of the short-time particle fl ow [1], [2]. By interaction of the laser radiation with the solid and the expanding cloud, a more or less ionized plasma is formed, dependin g on the wavelength and pulse shape, The properties of the deposit dep end essentially on the properties of the plasma, as energy content, de nsity, degree of ionization, and composition, Because of the complexit y of the phenomena involved, controlling the particle flow requires ex perimental analysis as well as theoretical modeling, The visualization of some experiment-related results of theoretical modeling is shown f or irradiation of Al targets with different lasers and regimes.