G. Granse et S. Vollmar, RESULTS OF MODELING LASER-INDUCED PLASMA IN PULSED-LASER DEPOSITION, IEEE transactions on plasma science, 24(1), 1996, pp. 47-48
Pulsed laser deposition (PLD) as a method for thin-film deposition is
distinguished by high energy and density of the short-time particle fl
ow [1], [2]. By interaction of the laser radiation with the solid and
the expanding cloud, a more or less ionized plasma is formed, dependin
g on the wavelength and pulse shape, The properties of the deposit dep
end essentially on the properties of the plasma, as energy content, de
nsity, degree of ionization, and composition, Because of the complexit
y of the phenomena involved, controlling the particle flow requires ex
perimental analysis as well as theoretical modeling, The visualization
of some experiment-related results of theoretical modeling is shown f
or irradiation of Al targets with different lasers and regimes.