The micro- and pico-structures of TiN films deposited by magnetron spu
ttering are related to their properties and deposition conditions. The
transition from porous to compact films and the changes in their micr
ohardnesses, lattice parameters and microstrains are controlled by the
temperature of deposition, gas pressure and energy of ion bombardment
. The extended crystallographic anisotropy of inhomogeneous lattice de
formations is a new phenomenenon in which thin polycrystalline films d
iffer from bulk stress-free materials.