K. Tanahashi et al., MAGNETIC-ANISOTROPY AND MICROSTRUCTURE OF OBLIQUELY EVAPORATED CO CR THIN-FILMS/, Journal of magnetism and magnetic materials, 153(3), 1996, pp. 265-272
Magnetic properties and the microstructure of Co/Cr thin films, prepar
ed by oblique-incidence depositions have been investigated. The 5-100
nm thick Co films with 200 +/- 50 nm thick Cr underlayers are found to
have an in-plane magnetic anisotropy with the easy axis transverse to
the incident plane. The coercivity H-c and the in-plane magnetic anis
otropy energy K-u,K-in-plane are dependent on both the incident angle
and the Co layer thickness. The highest H-c (240 kA/m) and the highest
K-u,K-in-plane (1 X 10(5) J/m(3)) values are obtained when the incide
nt angle is 70 degrees and the Co layer is 10 nm thick. The Co layer c
onsists of anisotropic shape clusters where the neighboring Co grains
along the incident plane are physically separated by the surface rough
ness of inclined Cr columnar grains, while the neighboring Co grains t
ransverse to the incident plane are connected. The temperature depende
nce of the K-u,K-in-plane suggests that the Co layer has a weak prefer
red c-axis orientation transverse to the incident plane. The contribut
ion of the crystalline anisotropy to the in-plane magnetic anisotropy
is shown to be comparable to that of the shape anisotropy of the Co cl
usters.