EPITAXIAL-GROWTH OF ALPHA-FE FILMS ON CAF2(111) SI(111) STRUCTURES/

Citation
N. Mattoso et al., EPITAXIAL-GROWTH OF ALPHA-FE FILMS ON CAF2(111) SI(111) STRUCTURES/, Thin solid films, 272(1), 1996, pp. 83-86
Citations number
18
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
272
Issue
1
Year of publication
1996
Pages
83 - 86
Database
ISI
SICI code
0040-6090(1996)272:1<83:EOAFOC>2.0.ZU;2-3
Abstract
Epitaxial Fe films with the (110) orientation were deposited on a CaF2 (111) buffer layer on Si(111) substrates. The structural characterizat ion of the epitaxial films included conventional and grazing angle X-r ay diffraction experiments, rocking curve crystal quality analysis, X- scans as well as scanning electron microscopy. The results show the in creasing quality of the Fe films with substrate temperature during dep osition. We discuss the crystal quality and the orientational relation ships of the Fe(110)/CaF2(111)/Si(111) system as compared with the Fe( 222)/Si(111) system.