DOPANT COMPENSATION MECHANISM AND LEAKAGE CURRENT IN PB(ZR-0.52,TI-0.48) O-3 THIN-FILMS

Citation
Ck. Barlingay et Sk. Dey, DOPANT COMPENSATION MECHANISM AND LEAKAGE CURRENT IN PB(ZR-0.52,TI-0.48) O-3 THIN-FILMS, Thin solid films, 272(1), 1996, pp. 112-115
Citations number
16
Categorie Soggetti
Physics, Applied","Material Science","Physics, Condensed Matter
Journal title
ISSN journal
00406090
Volume
272
Issue
1
Year of publication
1996
Pages
112 - 115
Database
ISI
SICI code
0040-6090(1996)272:1<112:DCMALC>2.0.ZU;2-R
Abstract
The dopant compensation mechanism in 2-5 mol.% niobium (Nb)-doped Pb(Z r0.52Ti0.48) O-3 (PZT) thin films was studied to obtain single phase c ompositions. Transmission electron microscopy showed that the Nb-doped composition batched according to the Ti vacancy model, was single pha se. This indicated that niobium donors were compensated by titanium va cancies at the B site. The beneficial effect of donors in single phase composition and detrimental effects of grain boundary second phases a nd accepters on the leakage currents are reported. The single-phase Nb -doped (5%) PZT thin film exhibited a low leakage current of 1 x 10(-7 ) A cm(-2) at 1.2 MV cm(-1).