COMPOSITIONAL MAPPING OF SEMICONDUCTOR STRUCTURES BY FRICTION FORCE MICROSCOPY

Citation
J. Tamayo et al., COMPOSITIONAL MAPPING OF SEMICONDUCTOR STRUCTURES BY FRICTION FORCE MICROSCOPY, Applied physics letters, 68(16), 1996, pp. 2297-2299
Citations number
18
Categorie Soggetti
Physics, Applied
Journal title
ISSN journal
00036951
Volume
68
Issue
16
Year of publication
1996
Pages
2297 - 2299
Database
ISI
SICI code
0003-6951(1996)68:16<2297:CMOSSB>2.0.ZU;2-T
Abstract
Topographic and chemical mapping of materials at high resolution defin e the goals of a microscope. Force microscopy can provide methods for simultaneous topography and chemical characterization of materials. He re we describe the use of the atomic force microscope to map chemical variations of semiconductor samples. Chemical maps of semiconductor In P/InGaAs alloys have been determined with 3 nm spatial resolution whil e 10% changes in indium composition are resolved in InxGa1-xAs structu res. The present resolution is limited by the tip's curvature radius, cantilever lateral force constant, and the total applied force. Theore tical calculations predict lateral compositional resolutions of about 1 nm. (C) 1996 American Institute of Physics.