STUDY OF DEPTH DISTRIBUTION SHIFT OF COPPER ON SILICON-WAFER SURFACE USING TOTAL-REFLECTION X-RAY-FLUORESCENCE SPECTROMETRY

Authors
MORI Y SHIMANOE K
Citation
Y. Mori et K. Shimanoe, STUDY OF DEPTH DISTRIBUTION SHIFT OF COPPER ON SILICON-WAFER SURFACE USING TOTAL-REFLECTION X-RAY-FLUORESCENCE SPECTROMETRY, Analytical sciences, 12(2), 1996, pp. 277-279
Citations number
8
Categorie Soggetti
Chemistry Analytical
Journal title
Analytical sciences → ACNP
ISSN journal
09106340
Volume
12
Issue
2
Year of publication
1996
Pages
277 - 279
Database
ISI
SICI code
0910-6340(1996)12:2<277:SODDSO>2.0.ZU;2-U