Jb. Bildesorensen et al., ON BASAL SLIP AND BASAL TWINNING IN SAPPHIRE (ALPHA-AL2O3) .1. BASAL SLIP REVISITED, Acta materialia, 44(5), 1996, pp. 2145-2152
Citations number
34
Categorie Soggetti
Material Science","Metallurgy & Metallurigical Engineering
The motion of partial dislocations (b = 1/3[01 (1) over bar 0] and 1/3
[10 (1) over bar 0]) parallel to during basal slip ((0001) 1/3[11 (2)
over bar 0]) in sapphire (alpha-Al2O3) is analysed. Crystallographic a
rguments suggest that the basal slip plane should be a plane passing t
hrough the normally-vacant octahedral sites defined by the anion subla
ttice. This definition of the basal slip plane implies that half of th
e cations lying between two adjacent anion layers are above and the ot
her half are below the slip plane. The stacking faults that would be c
reated by the motion of a dissociated basal dislocation differs in str
ucture and energy, depending on whether the 1/3 [10 (1) over bar 0] pa
rtial is leading or trailing. Thus, the motion of a 1/3[10 (1) over ba
r 0] partial in its favorable (lower energy) direction creates a stack
ing fault with a stacking sequence in which the cations are in a local
ized twin symmetry, whereas the motion of a 1/3[10 (1) over bar 0] par
tial in its unfavorable (higher energy) direction is ''forbidden''. Fu
rthermore, the motion of a 1/3[10 (1) over bar 0] partial in its favor
able direction can take place without the need for synchroshear.