PREPARATION OF LANTHANUM FLUORIDE NANOLAYERS BY DEPOSITING IONIC LAYERS ON SILICON SURFACE

Authors
ZHUCHKOV BS TOLSTOI VP MURIN IV KIRILLOV SN
Citation
Bs. Zhuchkov et al., PREPARATION OF LANTHANUM FLUORIDE NANOLAYERS BY DEPOSITING IONIC LAYERS ON SILICON SURFACE, Russian journal of applied chemistry, 68(5), 1995, pp. 736-738
Citations number
6
Categorie Soggetti
Chemistry Applied
Journal title
Russian journal of applied chemistry → ACNP
ISSN journal
10704272
Volume
68
Issue
5
Year of publication
1995
Part
2
Pages
736 - 738
Database
ISI
SICI code
1070-4272(1995)68:5<736:POLFNB>2.0.ZU;2-T
Abstract
The influence of preparation conditions (the concentration and the pH values of the solutions, the time of surface treatment, the number of cycles of ionic layer deposition) is studied on kinetics of growth of LaF3 nanolayers on silicon. surface.