We present a study of hexagonal GaN thin films grown by low-pressure c
hemical vapor deposition on sapphire substrates. We used synchrotron r
adiation photoemission spectroscopy to probe the electronic density of
states and test the validity of existing band structure calculations.
Parallel studies of surface composition and atomic structure by means
of Auger spectroscopy and reflection high-energy electron diffraction
were performed following sputtering/annealing cycles using argon, xen
on and nitrogen ions. We found that sputtering with nitrogen ions foll
owed by annealing in vacuum is an effective method to reduce nitrogen
surface depletion and produce quasi-stoichiometric ordered GaN(0001)1
x 1 surfaces.