A review is given of the pseudopotential total energy method and of it
s applications to the study of adsorption and diffusion processes of s
ingle adatoms on the Si(100) surface. The subjects covered include the
description of the computer code CASTEP/CETEP used for the simulation
s, results on the equilibrium structure and reconstructions of the cle
an Si(100) surface, the potential energy surface for a single Ge adato
m on the Si(100) surface, investigation of the possibility of the exch
ange mechanism for the Ge diffusion on this surface, the influence of
the adatom on the buckling of Si dimers, and the structure of the S-B
rebonded step.