Ma. Pariselle et al., DEPTH PROFILES OF INTERSTITIAL HALOGEN DEFECTS IN HIGH-ENERGY ION-BOMBARDED ALKALI IODIDES BY MICRO-RAMAN SPECTROSCOPY, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 107(1-4), 1996, pp. 250-253
Halogen aggregates created in alkali iodides by high energy ions consi
st of I-3(-), I-n(-) and (I-2)(n) as evidenced by Raman spectroscopy.
By extending our studies to micro-Raman measurements. it has been poss
ible to determine the depth profiles of the formation of halogen aggre
gates. It is shown that I-n(-) clusters are created with an enhanced c
oncentration in the region of large excitation density near the Bragg
peak at the expense of the I-3(-) defects. Several factors monitor the
relationship between I-3(-) and I-n(-) clusters. At saturation within
the ion tracks, these respective numbers critically depend on their m
utually coupled kinetics, their dose dependence and the degree of ion
track overlap. It is shown for example that I-3(-) defects are progres
sively enhanced with increasing fluences all along the ion tracks. Res
ults are compared to those obtained by X-ray irradiations.